机译:在较高的FTO衬底温度和Ar + O_2气氛下,脉冲激光沉积CdTe薄膜的制备和表征
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, Sichuan, China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, Sichuan, China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, Sichuan, China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, Sichuan, China;
Department of Physics and Astronomy, Kansas University, Lawrence 66045, USA;
CdTe thin films; Pulsed laser deposition; Substrate temperature; Solar cells;
机译:高衬底温度下Ar + O_2沉积压力对脉冲激光沉积CdTe薄膜性能的影响
机译:基板温度对脉冲激光沉积CdTe薄膜性能的影响
机译:Ar / O_2气氛中沉积CdTe薄膜的性能研究
机译:使用脉冲激光沉积在AR / O_2大气中制备YBA_2CU_3O_X薄膜的结构和电性能
机译:通过脉冲激光沉积法沉积的碲化铋和碲化锑薄膜的结构,电学和光学特性。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:通过脉冲激光沉积在Srruo3 / Srtio3substrate上的各种温度下沉积Pb(Zr0.2Ti0.8)O3膜的表征