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Nanoindentation and nanoscratch measurements on silicone thin films synthesized by pulsed laser ablation deposition (PLAD)

机译:通过脉冲激光烧蚀沉积(PLAD)合成的有机硅薄膜的纳米压痕和纳米划痕测量

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摘要

Nanoindentation and nanoscratch studies were conducted on silicone thin films synthesized by pulsed laser ablation deposition (PLAD). The nanoindentation studies showed that the modulus of the silicone films varied as a function of the energy density of deposition. The modulus values measured for PLAD silicone films were in the range of 1-6 GPa compared to 5-10 MPa reported for a typical silicone elastomer. Nanoscratch measurements also showed that PLAD silicone films exhibited much greater scratch resistance compared to silicone elastomer. These studies demonstrated that, even for low energy density depositions, the PLAD process can produced films which were are stronger and more abrasion resistant than conventional cross-linked silicone elastomers.
机译:对通过脉冲激光烧蚀沉积(PLAD)合成的有机硅薄膜进行了纳米压痕和纳米划痕研究。纳米压痕研究表明,有机硅膜的模量随沉积能量密度的变化而变化。与典型的有机硅弹性体报道的5-10 MPa相比,针对PLAD有机硅薄膜测得的模量值在1-6 GPa的范围内。纳米划痕测量还显示,与有机硅弹性体相比,PLAD硅树脂膜表现出更大的耐划伤性。这些研究表明,即使对于低能量密度的沉积,PLAD工艺也可以生产比传统的交联有机硅弹性体更坚固,更耐磨的薄膜。

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