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EPITAXIALLY GROWN LaNiO_3 THIN FILMS ON SrTiO_3(100) SUBSTRATES BY THE CHEMICAL SOLUTION METHOD

机译:用化学溶液法在SrTiO_3(100)衬底上生长表观生长的LaNiO_3薄膜

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摘要

LaNiO_3 (LNO) thin films were spin-coated onto the SrTiO_3(l00) (STO) substrates by the chemical solution method. X-ray diffraction (XRD) 0-20 scans and X-ray B scans were used to determine the crystallinity and in-plane alignment behavior of the films. XRD patterns showed that the LNO thin films obtained by annealing at 600--750deg.C were highly oriented, while the film annealed at 800deg.C had random orientation. The resistivity vs. temperature curve of the epitaxially grown film annealed at 750deg.C, confirmed by B scanning, showed that the film possessed good metallic character. The fracture cross section of the epitaxial LNO film on STO was unifOrm and dense along the cross section direction.
机译:通过化学溶液法将LaNiO_3(LNO)薄膜旋涂到SrTiO_3(100)(STO)衬底上。 X射线衍射(XRD)0-20扫描和X射线B扫描用于确定薄膜的结晶度和面内取向行为。 XRD图谱表明,在600--750℃下退火得到的LNO薄膜是高度取向的,而在800℃退火后的薄膜则具有随机取向。通过B扫描确认的在750℃退火的外延生长膜的电阻率-温度曲线表明,该膜具有良好的金属特性。 STO上的外延LNO膜的断裂横截面是统一的,并且沿横截面方向是致密的。

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