Growth of polycrystalline and nanocrystalline diamond films on pure titanium by microwave plasma assisted CVD process

摘要

Well-faceted polycrystalline diamond (PCD) films were deposited along with nanocrystalline diamond (NCD) films on the pure titanium substrate by a microwave plasma assisted chemical vapor deposition (MWPCVD) system in the environment of CH_4 and H_2 gases