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Ferroelectric properties of sol-gel deposited Pb(Zr,Ti)O_3/LaNiO_3 thin films on single crystal and platinized-Si substrates

机译:单晶和镀铂硅衬底上溶胶-凝胶沉积的Pb(Zr,Ti)O_3 / LaNiO_3薄膜的铁电性能

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摘要

Electrically conductive LaNiO_3 (LNO) and ferroelectric Pb(Zr_0.52Ti_0.48)O_3 (PZT) thin films were deposit on single crystal (100SrTiO_3 (STO), (100) LaNiO_3 (LAO), and Pt/Ti/SiO_2Si(100) substrates using solution deposition routes. X-ray diffraction and scanning electron microscopy were used to investigate the crystallinity and microstructure of the films. The surface bonding states of the PZT and LNO films were determined by X-ray photoelectron spectroscopy (XPS). The average room-temperature dielectric constant of the PZT films, measured at 1 kHz, was in the range 905-1002 and the dissipation factor was below 0.03 for all films. The remnant polarization and coercive electric field of the PZT/LNO films deposited on (100STO, (100)LAO, and Pt/Ti/SiO_2/Si substrates were 30, 32 and 19 μC/cm~2, and 84, 87 and 57 kV/cm, at applied electric field of 450 kV/cm, respectively.
机译:导电LaNiO_3(LNO)和铁电Pb(Zr_0.52Ti_0.48)O_3(PZT)薄膜沉积在单晶(100SrTiO_3(STO),(100)LaNiO_3(LAO)和Pt / Ti / SiO_2Si(100)上采用溶液沉积的方法,通过X射线衍射和扫描电子显微镜研究薄膜的结晶度和微观结构,并通过X射线光电子能谱(XPS)确定PZT和LNO薄膜的表面键合状态。在1 kHz下测量的PZT薄膜的室温介电常数在905-1002范围内,所有薄膜的耗散因子均低于0.03。沉积在(100STO上的PZT / LNO薄膜的残余极化和矫顽电场在施加的电场为450 kV / cm时,(100)LAO和Pt / Ti / SiO_2 / Si基板分别为30、32和19μC/ cm〜2,分别为84、87和57 kV / cm。

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