首页> 外文期刊>Materials Letters >Determination of vapour pressure and standard enthalpies of sublimation and vapourisation of N, N'-ethylenebis(2,4-pentanedion-iminoato)nickel(II) by a TG-based transpiration method
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Determination of vapour pressure and standard enthalpies of sublimation and vapourisation of N, N'-ethylenebis(2,4-pentanedion-iminoato)nickel(II) by a TG-based transpiration method

机译:基于TG的蒸腾法测定N,N'-亚乙基双(2,4-戊二酮-亚氨基)镍(II)的升华和汽化的蒸气压和标准焓

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摘要

In order to identify a volatile metallo-organic precursor for the deposition of nickel films for CVD applications, equilibrium vapour pressure (p_e) measurements were carried out on a N,N' -ethylenebis(2,4-pentanedion-iminoato)nickel(II) (Ni[(acac)_2en]) by employing a TG-based transpiration method over the range 406 to 495 K leading to values of 118.0 +- 4.1 and 83.3 +- 3.8 kJ mol~(-1) for the standard enthalpies of sublimation and vapourisation, respectively of Ni[(acac)_2en]. From the plot of log p_e against IT, the melting point was derived to be 463 K, which is in reasonable agreement with 469 +- 3 K reported in the literature and was also observed in DTA and melting point studies.
机译:为了鉴定用于CVD应用的镍膜沉积的挥发性金属有机前体,对N,N'-亚乙基双(2,4-戊二酮-亚氨基)镍(II)进行了平衡蒸气压(p_e)测量(Ni [(acac)_2en])通过在406至495 K范围内采用基于TG的蒸腾方法得出标准焓为118.0 +-4.1和83.3 +-3.8 kJ mol〜(-1) Ni [(acac)_2en]的升华和汽化。从log p_e对IT的曲线图中,得出的熔点为463 K,与文献中报道的469±3 K合理吻合,并且在DTA和熔点研究中也观察到。

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