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Optical constants of transparent ZnO films by RF magnetron sputtering

机译:射频磁控溅射法制备透明ZnO薄膜的光学常数

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摘要

The transparent ZnO films were deposited on quartz glass slides by RF magnetron sputtering and then the films are annealed at 500, 700, 900 ℃ for 60 min in pure O_2. The optical transmission spectra for the as-grown and annealed ZnO films have been measured over the 300 nm to 700 nm spectral region. The optical constants and thickness of the films have been determined using a nonlinear programming method suggested by Birgin et al. The optical band gap has been determined from the absorption coefficient. The optical quality of ZnO films is improved by annealing.
机译:透明ZnO薄膜通过RF磁控溅射沉积在石英玻璃载片上,然后在纯O_2中分别于500、700、900℃退火60分钟。生长和退火后的ZnO薄膜的光学透射光谱已在300 nm至700 nm的光谱范围内进行了测量。薄膜的光学常数和厚度已使用Birgin等人提出的非线性编程方法确定。由吸收系数确定了光学带隙。 ZnO薄膜的光学质量可通过退火得到改善。

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