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Influence of Sputtering Power on Structural and Optical Properties of ZnO Films Fabricated by RF Magnetron Sputtering

机译：溅射功率对射频磁控溅射制备ZnO薄膜结构和光学性质的影响

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Zhou Yang; Zheng Hong-fang; Zhao Guang; Li Man;
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1. Influences of sputtering power and annealing temperature on the structural and optical properties of AI_2O_3:CuO thin films fabricated by radio frequency magnetron sputtering technique [J] . S. Ponmudi, R. Sivakumar, C. Sanjeeviraja, Journal of materials science . 2019,第20期

机译：溅射功率和退火温度对射频磁控溅射技术制备的AI_2O_3：CuO薄膜的结构和光学性能的影响
2. Influence of RF power on structural, morphology, electrical, composition and optical properties of Al-doped ZnO films deposited by RF magnetron sputtering [J] . Ravindra G. Waykar, Amit S. Pawbake, Rupali R. Kulkarni, Journal of materials science . 2016,第2期

机译：射频功率对射频磁控溅射沉积铝掺杂ZnO薄膜结构，形貌，电学，组成和光学性质的影响
3. Influence of sputter-etching of substrate on the microstructural and optical properties of ZnO films deposited by RF magnetron sputtering [J] . C.P. Li, B.H. Yang, X.C. Wang, Applied Surface Science . 2011,第14期

机译：衬底溅射刻蚀对射频磁控溅射沉积ZnO薄膜的微观结构和光学性能的影响
4. Role of Sputtering Power on the structural and optical properties of ZnO/SiO_2 Films deposited by radio frequency magnetron sputtering [C] . Shuang Li, Ming Chen, Feng-xiang Wang International Conference on Opto-Electronics Engineering and Materials Research . 2013

机译：溅射功率对通过射频磁控溅射沉积的ZnO / SiO_2膜的结构和光学性质的作用
5. Study of structural, electrical, optical and magnetic properties of zinc oxide based films produced by magnetron sputtering. [D] . Angelats Silva, Luis Manuel. 2007

机译：研究磁控溅射生产的氧化锌基薄膜的结构，电，光和磁性能。
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

机译：射频磁控溅射制备（MgAl）共掺杂ZnO薄膜的光电性能研究与研究
7. Erratum: “Effects of low-temperature-buffer, rf-power, and annealing on structural and optical properties of ZnO/Al2O3(0001) thin films grown by rf-magnetron sputtering” J. Appl. Phys. 106, 023511 (2009) [O] . H. F. Liu, S. J. Chua 2009

机译：错误：“低温缓冲液，RF功率和退火对由RF-磁控溅射生长的ZnO / Al2O3（0001）薄膜结构和光学性质的影响”J。苹果。物理。 106,023511（2009）

Influence of Sputtering Power on Structural and Optical Properties of ZnO Films Fabricated by RF Magnetron Sputtering

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