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首页> 外文期刊>Materials Letters >Ferroelectricity of ultrathin ferroelectric Langmuir-Blodgett polymer films on conductive LaNiO_3 electrodes
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Ferroelectricity of ultrathin ferroelectric Langmuir-Blodgett polymer films on conductive LaNiO_3 electrodes

机译:导电LaNiO_3电极上超薄铁电Langmuir-Blodgett聚合物薄膜的铁电性

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摘要

LaNiO_3 (LNO) films with a surface roughness rms of 0.384 nm and a sheet resistance of about 200 Ω were prepared on SrTiO_3 and Si/SiO_2 substrates respectively by rf magnetron sputtering technique. The sur face of LNO on Si/SiO_2 substrate is smoother than that on SrTiO_3 substrate. A nominal 2-monolayer (ML) poly(vinylidenefluoride-trifluoroethylene) film with a thickness of about 3 nm was deposited on LNO coated Si/SiO_2 substrate by Langmuir-Blodgett (LB) technology. Piezoresponse force microscopy (PFM) measure ments show that the LB films demonstrate an obvious feature of polarization switching and good voltage durability. The results suggest that the ultrathin polymer films may be utilized to explore ferroelectric tunnel junctions.
机译:利用射频磁控溅射技术分别在SrTiO_3和Si / SiO_2衬底上制备了表面粗糙度均方根值为0.384 nm,薄层电阻约为200Ω的LaNiO_3(LNO)薄膜。 Si / SiO_2衬底上的LNO表面比SrTiO_3衬底上的表面更光滑。通过Langmuir-Blodgett(LB)技术,在LNO涂层的Si / SiO_2衬底上沉积厚度约为3 nm的标称2单层(ML)聚偏二氟乙烯-三氟乙烯膜。压电响应力显微镜(PFM)测量表明,LB薄膜具有明显的极化切换和良好的电压耐久性的特征。结果表明,超薄聚合物膜可用于探索铁电隧道结。

著录项

  • 来源
    《Materials Letters》 |2011年第12期|p.1989-1991|共3页
  • 作者单位

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ferroelectric tunnel junctions; unio_3 films; lb films; ferroelectricity;

    机译:铁电隧道结;uni_3薄膜;lb薄膜;铁电;

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