机译:热蒸发法在硅表面制备WO3薄膜及其表征
Sun Yat Sen Univ, Inst Solar Energy Syst, Guangdong Prov Key Lab Photovolta Technol, Guangzhou 510006, Guangdong, Peoples R China;
Sun Yat Sen Univ, Inst Solar Energy Syst, Guangdong Prov Key Lab Photovolta Technol, Guangzhou 510006, Guangdong, Peoples R China;
Sun Yat Sen Univ, Inst Solar Energy Syst, Guangdong Prov Key Lab Photovolta Technol, Guangzhou 510006, Guangdong, Peoples R China;
Sun Yat Sen Univ, Inst Solar Energy Syst, Guangdong Prov Key Lab Photovolta Technol, Guangzhou 510006, Guangdong, Peoples R China;
Sun Yat Sen Univ, Inst Solar Energy Syst, Guangdong Prov Key Lab Photovolta Technol, Guangzhou 510006, Guangdong, Peoples R China|Shun De SYSU Inst Solar Energy Syst, Shun De 528300, Peoples R China;
WO3 thin film; Solar energy materials; Atomic force microscopy; Growth model; Flatband voltage; Fixed charges;
机译:通过热真空蒸发技术制备的MoO3和WO3薄膜的结构,形态,气敏和光催化特性
机译:Ge(100)改性衬底上热蒸发的BaSi_2薄膜的制备及性能表征
机译:用于热真空蒸发制备的光电器件的纳米晶硅薄膜的制备
机译:PB_(1-X)YB_XSE_(0.2)TE_(0.8)基基合金薄膜的制造和表征使用热蒸发方法生长的热电发电机
机译:增强硅表面上的核沸腾和薄膜蒸发的实验研究
机译:热蒸发法制备NiO-WO3薄膜的表面形貌和传感性能
机译:热蒸发法制备NiO-WO3薄膜的表面形貌和传感性能