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Fabrication and properties characterization of BaSi_2 thin-films thermally-evaporated on Ge (100) modified substrates

机译:Ge(100)改性衬底上热蒸发的BaSi_2薄膜的制备及性能表征

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The fabrication of orthorhombic barium disilicide (BaSi2) thin-films on modified germanium (Ge) substrates by thermal evaporation method was demonstrated, in which the surface modification of Ge substrate was performed by a simple chemical etching method. The effects of etching time on crystalline quality and optical properties of the BaSi2 films were investigated. The results revealed that the substrate modification has positive impact in improving the crystalline quality, reducing the light reflection, and increasing the absorption of the BaSi2 thin-films. Etching time was optimized at 15 min, considering the trade-off between crystalline quality and optical properties. Minority carrier-lifetime of the evaporated film on Ge substrate achieved 3.17 mu s, which is among the high value obtained for thin BaSi2 films.
机译:演示了通过热蒸发法在改性锗(Ge)衬底上制备斜方晶二硅化钡(BaSi2)薄膜的方法,其中通过简单的化学刻蚀方法对Ge衬底进行了表面改性。研究了刻蚀时间对BaSi2薄膜晶体质量和光学性能的影响。结果表明,基板改性对改善晶体质量,减少光反射和增加BaSi2薄膜的吸收具有积极影响。考虑到晶体质量和光学性能之间的权衡,蚀刻时间在15分钟时达到最佳。 Ge衬底上的蒸发膜的少数载流子寿命达到3.17μs,这是对于BaSi 2薄膜获得的高值。

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