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High-performance BiFe0.95Mn0.05O3 ferroelectric film epitaxially integrated on GaN substrate with LSMO/TiO2 bi-layer buffer

机译:用LSMO / TiO2双层缓冲液外延集成在GaN衬底上的高性能BiFe0.95Mn0.05O3铁电薄膜

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摘要

The highly (111)-oriented BiFe0.95Mn0.05O3 (BFMO) films owning exellent ferroelectric performance have been epitaxially grown on (0002) GaN substrates with La0.7Sr0.3MnO3 (LSMO)/TiO2 bi-layer buffer by pulsed laser deposition. By means of the LSMO/TiO2 bi-layer buffer, the lattice mismatch between perovskite (111) BFMO and wurtzite (0002) GaN was miraculously decreased from 12.4% to 1.4%. The remnant ferroelectric polarization and coercive field of the BFMO (111) film were determined to be 115 mu C/ cm(2) and 450 kV/cm, respectively. Compared with the BFMO film deposited on the bare GaN substrate, the remnant ferroelectric polarization was enhanced by 92%. The piezoresponse force microscopy (PFM) image further confirmed that the BFMO (111) film owned perfect ferroelectric switching properties. (C) 2017 Elsevier B.V. All rights reserved.
机译:通过脉冲激光沉积在具有La0.7Sr0.3MnO3(LSMO)/ TiO2双层缓冲层的(0002)GaN衬底上外延生长具有出色铁电性能的高度(111)取向的BiFe0.95Mn0.05O3(BFMO)薄膜。借助LSMO / TiO2双层缓冲液,钙钛矿(111)BFMO和纤锌矿(0002)GaN之间的晶格失配奇迹般地从12.4%降低至1.4%。 BFMO(111)膜的残余铁电极化和矫顽场分别确定为115μC / cm(2)和450 kV / cm。与沉积在裸露的GaN衬底上的BFMO膜相比,残余铁电极化增强了92%。压电响应力显微镜(PFM)图像进一步证实BFMO(111)膜具有完善的铁电开关特性。 (C)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Materials Letters》 |2017年第15期|240-243|共4页
  • 作者单位

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Shanghai Inst Technol, Sch Mat Sci & Engn, 100 Haiquan Rd, Shanghai 201418, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ferroelectrics; Bismuth ferrite; Bi-layer buffer; Epitaxial growth; GaN integration;

    机译:铁电体;铁酸铋;双层缓冲层;外延生长;GaN集成;

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