Low-temperature deposition of (110) and (101) rutile TiO_2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite

摘要

Thin films of both (110) and (101) rutile titanium dioxide (TiO_2) were synthesized using a dual cathode DC unbalanced magnetron sputtering at low temperature with various substrate bias voltages (V_(sb)) ranging between 0 and -150 V. The TiO_2 film prepared with V_(sb) = 0 underwent heat treatment after deposition. It was observed that the (110) rutile phase was deposited on the film with V_(sb) below -50 V. Furthermore, the film showed high crystallinity after the heat treatment. However, when using V_(sb) above -50 V, the phase of film shifted to (101) due to the formation of high-energy particles on the surface. For m vitro testing, the samples were immersed in simulated body fluid (SBF) for 7 days. The heat-treated (110) rutile shows a poor distribution of hydroxyapatite (HA) formation, generally causing the stress effect. The film was prepared with V_(sb) = 50 V and observed to form higher crystallinity of HA.