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Thickness-dependent properties of sprayed iridium oxide thin films

机译:喷涂氧化铱薄膜的厚度依赖性

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Iridium oxide thin films with variable thickness were deposited by spray pyrolysis technique (SPT), onto the amorphous glass substrates kept at 350degreesC. The volume of iridium chloride solution was varied to obtain iridium oxide thin films with thickness ranging from 700 to 2250 Angstrom. The effect of film thickness on structural and electrical properties was studied. The X-ray diffraction (XRD) studies revealed that the as-deposited samples were amorphous and those annealed at 600 degreesC for 3 h in milieu of air were polycrystalline IrO2. The crystallinity of Ir-oxide films ameliorate with film thickness thereby preferred orientation along (110) remains unchanged. The infrared spectroscopic results show Ir-O and Ir-O-2 bands. The room temperature electrical resistivity (rho(RT)) of these films decreases with increase in film thickness. The p-type semiconductor to metallic transition was observed at 600degreesC. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 31]
机译:通过喷雾热解技术(SPT)将厚度可变的氧化铱薄膜沉积到保持在350℃的非晶玻璃基板上。改变氯化铱溶液的体积以获得厚度为700至2250埃的氧化铱薄膜。研究了膜厚度对结构和电性能的影响。 X射线衍射(XRD)研究表明,沉积后的样品为无定形,在空气中于600℃退火3 h的样品为多晶IrO2。 Ir-氧化物膜的结晶度随膜厚度而改善,从而沿(110)的优选取向保持不变。红外光谱结果显示Ir-O和Ir-O-2带。这些膜的室温电阻率(rho(RT))随着膜厚度的增加而降低。在600℃下观察到p型半导体向金属的转变。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:31]

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