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首页> 外文期刊>Materials & design >Effect of lanthanides on phase transformation and structural properties of LnNbO_4 and LnTaO_4 thin films
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Effect of lanthanides on phase transformation and structural properties of LnNbO_4 and LnTaO_4 thin films

机译:镧系元素对LnNbO_4和LnTaO_4薄膜的相变和结构性能的影响

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摘要

Lanthanide niobate LnNbO(4) (LnNO) and tantalate LnTaO(4) (LnTO) thin films (similar to 100 nm) were prepared by sol-gel/spin-coating process on PZT/Al2O3 substrates and annealing at 1000 degrees C (Ln = Nd, Sm, Eu and Gd). The LnNO (NNO, SNO, ENO and GNO) and LnTO (NTO, STO, ETO and GTO) precursors of films were synthesized using Nb or Ta tartrate complexes. The different phase transformations were identified in LnNO or LnTO precursors from fluorite T'-structure via tetragonal T-LnNbO(4) (NNO, SNO and GNO) or T-EuNb5O14 and T-NdTaO4, T-SmTa7O19, hexagonal H-EuTa7O19 and cubic C-GdTa7O19 to monoclinic M-LnNbO(4) or M'-LnTaO(4) during annealing at 7001200 degrees C. The XRD results of LnNO or LnTO films confirmed the coexistence of monoclinic LnNbO(4) or LnTaO(4) phase in addition to the tetragonal as main phase at 1000 degrees C. In STO film, the single monoclinic M'-SmTaO4 phase was revealed. The surface morphology and topography of thin films were investigated by the SEM and AFM analysis. STO film was smoother with roughness of 3.23 nm in comparison with SNO (6.35 nm). Effect of lanthanides can contribute to the formation different polymorphs of these films for the application to environmental electrolytic thin film devices. (C) 2017 Elsevier Ltd. All rights reserved.
机译:通过在PZT / Al2O3衬底上进行溶胶-凝胶/旋涂工艺并在1000摄氏度(Ln)下退火制备了镧系元素铌酸镧LnNbO(4)(LnNO)和钽酸镧LnTaO(4)(LnTO)薄膜(类似于100 nm) = Nd,Sm,Eu和Gd)。膜的LnNO(NNO,SNO,ENO和GNO)和LnTO(NTO,STO,ETO和GTO)的前体是使用酒石酸Nb或Ta络合物合成的。从萤石T'结构通过四方T-LnNbO(4)(NNO,SNO和GNO)或T-EuNb5O14和T-NdTaO4,T-SmTa7O19,六边形H-EuTa7O19和LnNO或LnTO前体中鉴定出不同的相变在7001200摄氏度的退火过程中,将立方C-GdTa7O19转变为单斜晶M-LnNbO(4)或M'-LnTaO(4)。LnNO或LnTO膜的XRD结果证实了单斜晶LnNbO(4)或LnTaO(4)相共存除了在1000摄氏度时以四方晶为主相外。在STO膜中,发现了单单斜M'-SmTaO4相。通过SEM和AFM分析研究了薄膜的表面形态和形貌。与SNO(6.35 nm)相比,STO膜更平滑,粗糙度为3.23 nm。镧系元素的作用可有助于形成这些膜的不同多晶型物,以应用于环境电解薄膜器件。 (C)2017 Elsevier Ltd.保留所有权利。

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