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首页> 外文期刊>Lasers in Manufacturing and Materials Processing >Phase Analysis of Laser Direct Etching and Water Assisted Laser Combined Etching of SiC Ceramics
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Phase Analysis of Laser Direct Etching and Water Assisted Laser Combined Etching of SiC Ceramics

机译:SiC陶瓷激光直接刻蚀和水辅助激光联合刻蚀的相分析

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摘要

In this study, to discover the etching mechanism of SiC ceramics under laser direct etching and water-jet assisted laser combined etching, the phenomena of substance change on the etched surface were investigated. Also, the rules of substance transfer in etching are discussed. The elemental content change and the phase change of the etching products on the etched surface were analyzed by energy dispersive spectroscopy (EDS) and X-ray diffraction (XRD), respectively. These studies showed a high amount of carbon black on the etched surface, because of the decomposition of SiC ceramics under the high-power-density laser irradiation. SiC decomposed to Si under the laser irradiation, and the subsequent chemical reaction of Si and O_2 easily produced SiO_2. The SiO_2 on the etched surface melted and vaporized, whereas most of SiO_2 was removed through splashing, changing the chemical composition of the etched surface. Following the water jet introduction, an increased amount of O existed on the combined etching surface, because the chemical reaction of SiC and H_2O easily produced SiO_2 under the high-power-density laser irradiation.
机译:为了研究SiC陶瓷在激光直接刻蚀和水射流辅助激光复合刻蚀下的刻蚀机理,研究了刻蚀表面物质变化的现象。此外,讨论了蚀刻中物质转移的规则。分别通过能量色散光谱法(EDS)和X射线衍射(XRD)分析了蚀刻表面上蚀刻产物的元素含量变化和相变。这些研究表明,由于在高功率密度激光照射下SiC陶瓷的分解,蚀刻后的表面上存在大量的炭黑。 SiC在激光照射下分解为Si,随后Si与O_2的化学反应容易产生SiO_2。刻蚀表面上的SiO_2熔化并汽化,而大部分SiO_2通过喷溅去除,从而改变了刻蚀表面的化学成分。引入水射流之后,由于在高功率密度激光照射下SiC与H_2O的化学反应容易产生SiO_2,因此在复合蚀刻表面上存在的O数量增加。

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