Site-Selective Deposition of TiO_2 Thin Films Using Self-Assembled Monolayers and Their Dielectric Properties

摘要

TiO_2 thin films were grown on several kinds of SAMs (self-assembled monolayers) using TC (titanium tetrachloride), TDD (titanium dichloride diethoxide) or TE (titanium tetraethoxide) as a starting material. We attempted to improve the feature edge acuity through controlling the reactivity by changing starting materials and surface functional groups of SAMs. The deposition of TiO_2 from TC or TDD solution was promoted on the silanol group, and the deposition was suppressed on ors (octadecyltrichloro-silane)-SAM. On the other hand, TiO_2 was deposited from TE solution regardless of the type of a surface functional group in the whole area of patterned SAMs.