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Study on Mechanism for Material Removal and Surface Generation by Molecular Dynamics Simulation in Abrasive Processes

机译:磨料过程中分子动力学模拟的材料去除和表面生成机理研究

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摘要

Molecular dynamics method which is different to continuous linear mechanics is employed to survey the features of grinding and indentation energy dissipation, forces, stress state the atomic space, and then explain the micro-scale mechanism of material removed and surface generation. The research shows that the atoms of the lattice reconstituting and some non-crystal layer are pilled up on the front of abrasive grain, as a result of the continuous advancement of the abrasive grain; the material is removed and formed the grinding chips. The degenerating layer of machined surface is formed with the reconstituting of non-crystal atoms and fracture atomic bonds; it consists of outer non-crystal and inner lattice deformation layers.
机译:采用与连续线性力学不同的分子动力学方法研究了磨削和压痕能量耗散,力,应力状态的原子空间特征,并解释了材料去除和表面产生的微观机理。研究表明,由于磨粒的不断推进,晶格重构原子和一些非晶体层堆积在磨粒的正面。去除材料,形成磨屑。加工表面的退化层是由非晶原子和断裂原子键的重组形成的。它由外部非晶层和内部晶格变形层组成。

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