首页> 外文期刊>Key Engineering Materials >Analyzed by Kelvin Force Microscopy of PbZr_(0.3)Ti_(0.7)O_3 thin films grown on La_(0.5)Sr_(0.5)CoO_3 or LaMnO_3 bottom electrodes
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Analyzed by Kelvin Force Microscopy of PbZr_(0.3)Ti_(0.7)O_3 thin films grown on La_(0.5)Sr_(0.5)CoO_3 or LaMnO_3 bottom electrodes

机译:通过开尔文力显微镜对在La_(0.5)Sr_(0.5)CoO_3或LaMnO_3底部电极上生长的PbZr_(0.3)Ti_(0.7)O_3薄膜进行分析

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摘要

We have investigated structural and electrical properties of PbZr_(0.3)Ti_(0.7)O_3 (PZT) thin films deposited by pulsed laser deposition methods. In order to improve the ferroelectric properties of PZT thin films, we have controlled grain size or surface morphology by changing bottom electrode or deposition time. PZT thin films have been deposited on La_(0.5)Sr_(0.5)CoO_3 (LSCO) or LaMnO_3 (LMO) bottom electrodes with LaAlO_3 substrates during different deposition times. X-ray diffraction data have shown that all the PZT films and bottom electrodes are highly oriented with their c-axes normal to the substrates. The thickness of each film is determined by field-emission scanning electron microscope. We have also observed alternation of grain sizes (80~180 nm) by using atomic force microscopy mode and surface potential distribution and retention behavior of ferroelectric domains by using Kelvin force microscopy mode. A PZT/LMO structure has shown superior ferroelectric and retention properties to a PZT/LSCO structure.
机译:我们已经研究了通过脉冲激光沉积方法沉积的PbZr_(0.3)Ti_(0.7)O_3(PZT)薄膜的结构和电学性质。为了改善PZT薄膜的铁电性能,我们通过改变底部电极或沉积时间来控制晶粒尺寸或表面形态。在不同的沉积时间下,已使用LaAlO_3衬底在La_(0.5)Sr_(0.5)CoO_3(LSCO)或LaMnO_3(LMO)底部电极上沉​​积了PZT薄膜。 X射线衍射数据表明,所有PZT膜和底部电极的c轴均垂直于基板,因此高度取向。每个膜的厚度通过场发射扫描电子显微镜确定。我们还观察到了使用原子力显微镜模式观察到的晶粒尺寸(80〜180 nm)的变化,以及使用开尔文力显微镜观察了铁电畴的表面电势分布和保留行为。 PZT / LMO结构显示出优于PZT / LSCO结构的铁电和保持性能。

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