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首页> 外文期刊>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures >Fabrication of digital planar holograms into high refractive index waveguide core for spectroscopy-on-chip applications
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Fabrication of digital planar holograms into high refractive index waveguide core for spectroscopy-on-chip applications

机译:将数字平面全息图制作到高折射率波导核中以用于片上光谱应用

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摘要

A novel class of large-bandwidth wavelength demultiplexers, based on digital planar holography for on-chip spectroscopy applications, was fabricated in high refractive index contrast SiO2/Si3N4 planar waveguides. The devices consist of computer-generated digital planar holograms (DPHs) encoding the transfer function of the demultiplexers, engraved on the core layer of the optical waveguide. An optimized fabrication process has been developed to produce DPHs with an etching depth as low as 10 nm in Si3N4. The first spectrometer devices exhibit overall bandwidths as large as 98 nm and spectral channel spacings down to 0.3 nm/channel.
机译:在高折射率对比SiO2 / Si3N4平面波导中,制造了基于数字平面全息技术的新型一类大带宽波长多路分解器,用于芯片上光谱应用。这些设备由刻在光波导核心层上的计算机生成的数字平面全息图(DPH)组成,这些数字全息图编码了多路分解器的传递函数。已经开发出一种优化的制造工艺来生产在Si3N4中蚀刻深度低至10 nm的DPH。第一台光谱仪设备的整体带宽高达98 nm,光谱通道间距低至0.3 nm /通道。

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