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首页> 外文期刊>Journal of Vacuum Science & Technology. B >Electrical characteristics of (pb, Sr) TiO_3 thin fiolms for films for ulta-large-scale- integrated dynamic random access memory capacitors prepared by liquid-source misted chemical deposition
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Electrical characteristics of (pb, Sr) TiO_3 thin fiolms for films for ulta-large-scale- integrated dynamic random access memory capacitors prepared by liquid-source misted chemical deposition

机译:(pb,Srtio3薄膜的电特性,用于通过液体源雾化化学沉积制备的超大规模集成动态随机存取存储电容器的薄膜

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摘要

For the first tie, the physical and electrical properties of lead-strontium-titanate (PST) thin films were prepared by liquid-source misted chemical deposition, and are reported. PST thin films were deposited on a platinum-coated Si wafer. Pb acetate, Sr acetate, and Ti isoproxide were use as metallic precursors. These were dissolved in 2-methoxyethnol. A fine mist of metallic precursor solution was carried into a deposition chamber by Ar carrier gas.
机译:首先,通过液体源雾化化学沉积法制备了钛酸锶锶(PST)薄膜的物理和电学性质,并进行了报道。将PST薄膜沉积在镀铂的Si晶片上。乙酸铅,乙酸锶和异丙氧基钛被用作金属前体。将它们溶解在2-甲氧基乙烯醇中。金属前驱物溶液的细雾通过Ar载气带入沉积室。

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