首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Generalized model of the metal-GaN Schottky interface and improved performance by electrochemical Pt deposition
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Generalized model of the metal-GaN Schottky interface and improved performance by electrochemical Pt deposition

机译:金属/ n-GaN肖特基界面的通用模型以及通过电化学Pt沉积改善的性能

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摘要

A modified model of the Schottky interface is proposed, which includes a near-surface layer (NSL) in the depletion region of the semiconductor. An important effect of the NSL is the ability to make the value of the Schottky barrier strongly voltage dependent, in agreement with experimental behavior. The proposed model can therefore qualitatively explain the observed peculiarities of Schottky contacts to the GaN and. related materials. Pt-GaN Schottky contacts were fabricated by both electrochemical deposition and e-beam evaporation techniques. The use of electrochemistry resulted in significantly better performance of Schottky contacts. A comparative study of evaporated and electroplated contacts justifies the NSL model. (c) 2006 American Vacuum Society.
机译:提出了肖特基界面的改进模型,该模型在半导体的耗尽区中包括一个近表面层(NSL)。 NSL的重要作用是能够使肖特基势垒的值与电压密切相关,这与实验行为一致。因此,所提出的模型可以定性地解释所观察到的肖特基触点与GaN和GaN的特性。相关资料。通过电化学沉积和电子束蒸发技术制造了Pt / n-GaN肖特基接触。电化学的使用显着改善了肖特基接触的性能。对蒸发和电镀触点的比较研究证明了NSL模型的合理性。 (c)2006年美国真空学会。

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