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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Fabrication of organic light-emitting devices on flexible substrates using a combined roller imprinting and photolithography-patterning technique
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Fabrication of organic light-emitting devices on flexible substrates using a combined roller imprinting and photolithography-patterning technique

机译:结合辊压印和光刻图案化技术在柔性基板上制造有机发光器件

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摘要

A patterning method has been developed to fabricate patterned organic light-emitting devices (OLEDs) (60 X 80 mm(2)) with a pixel size of 50.0 X 300 mu m(2) on flexible polyethylene terephthalate substrates. The patterns of the pixel array were defined in crossed-strip style with indium tin oxide anode and patterned using a combination of roller-type imprinting lithography and photolithography (CRIP) followed by wet etching. Compared with conventional imprint lithography or photolithography, the CRIP technique has the advantages of better uniformity, less force, consuming less time, lower cost, and higher aspect ratio. The performance of the CRIP OLEDs was the following: the turn-on voltage at 1 cd/m(2) was 7.5 V and the maximum luminance was, 13 530 cd/m(2) at 17.5 V. The highest luminous efficiency reached 1.27 lm/W (3.23 cd/A) at a luminance of 4.8 cd/m(2) and kept the values stable from 5 to 15 V. The performance was comparable to that of devices patterned by conventional photolithography. (c) 2006 American Vacuum Society.
机译:已经开发出图案化方法以在柔性聚对苯二甲酸乙二醇酯基板上制造像素尺寸为50.0 X 300μm(2)的图案化有机发光器件(OLED)(60 X 80 mm(2))。像素阵列的图案用铟锡氧化物阳极以交叉条纹的方式定义,并结合使用辊式压印光刻和光刻(CRIP)以及随后的湿蚀刻进行图案化。与传统的压印光刻或光刻相比,CRIP技术具有更好的均匀性,更少的力,更少的时间,更低的成本以及更高的长宽比。 CRIP OLED的性能如下:1 cd / m(2)时的开启电压为7.5 V,17.5 V时最大亮度为13 530 cd / m(2)。最高发光效率达到1.27。亮度为4.8 cd / m(2)时为lm / W(3.23 cd / A),并且该值在5至15 V范围内保持稳定。该性能可与通过传统光刻技术构图的器件相媲美。 (c)2006年美国真空学会。

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