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首页> 外文期刊>Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films >Surface analysis of contaminated GaAs: Comparison of new laser‐based techniques with SIMS
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Surface analysis of contaminated GaAs: Comparison of new laser‐based techniques with SIMS

机译:污染的GaAs的表面分析:基于激光的新技术与SIMS的比较

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A method of surface analysis by laser ionization (SALI) has been developed recently with an elemental sensitivity comparable to secondary ion mass spectrometry (SIMS). This mass spectrometric method uses intense UV laser general postionization following desorption or sputtering. The method has been applied to the analysis of a clean and contaminated GaAs(100) sample. Using an Ar+ beam for sputtering, direct comparison with SIMS shows the much more quantitative nature of SALI spectra. A 1.06‐μm laser beam also was used to remove material for analysis, and comparisons are again made between desorbed neutral and ion species. Several potential uses of SALI are described for chemical analysis and for investigations of fundamental desorption mechanisms.
机译:最近已经开发了一种通过激光电离(SALI)进行表面分析的方法,其元素灵敏度可与二次离子质谱(SIMS)媲美。此质谱方法在解吸或溅射后使用强烈的UV激光一般后离子化。该方法已应用于分析干净且受污染的GaAs(100)样品。使用Ar +束进行溅射,与SIMS的直接比较显示了SALI光谱的更多定量性质。还使用1.06μm的激光束去除材料进行分析,然后再次对解吸的中性离子物种进行了比较。描述了SALI在化学分析和基本解吸机理研究中的几种潜在用途。

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