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Large-Diameter InGaAs/AlGaAs Vertical-Cavity Surface-Emitting Lasers with LowThreshold Current Density Fabricated Using a Simple Chemical Etch Process

机译:采用简单化学蚀刻工艺制造的具有低阈值电流密度的大直径InGaas / alGaas垂直腔面发射激光器

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We have demonstrated threshold current densities below 800 A/sq cm in large-diameter (75 micrometers < d< 150 micrometers vertical-cavity surface-emitting lasers fabricated from an epitaxial structure containing a single In(0.2)Ga(0.8)As quantum well in a one-wavelength-long Fabry-Perot resonant cavity. The fabrication process uses a circular Au/Cr/Au disk as both the p-type contact and the mask for chemically etching individual diodes.

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