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首页> 外文期刊>Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films >Chemistry of Cu(acac)2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processes
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Chemistry of Cu(acac)2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processes

机译:Ni(110)和Cu(110)表面上Cu(acac)2的化学性质:对原子层沉积工艺的影响

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The thermal chemistry of copper(II)acetylacetonate, Cu(acac)2, on Ni(110) and Cu(110) single-crystal surfaces was probed under vacuum by using x-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD). Some data for acetylacetone (Hacac, CH3COCH2COCH3) adsorbed on Ni(110) are also reported as reference. Chemical transformations were identified in several steps covering a temperature range from 150 K to at least 630 K. The desorption of Hacac and a 3-oxobutanal (CH3COCH2CHO) byproduct was observed first at 150 and 180 K on Ni(110) and at 160 and 185 K on Cu(110), respectively. Partial loss of the acetylacetonate (acac) ligands and a likely change in adsorption geometry are seen next, with the possible production of HCu(acac), which desorbs at 200 and 235 K from the nickel and copper surfaces, respectively. Molecular Cu(acac)2 desorption is observed on both surfaces at approximately 300 K, probably from recombination of Cu(acac) and acac surface species. The remaining copper atoms on the surface lose their remaining acac ligands to the substrate and become reduced directly to metallic copper. At the same time, the organic ligands follow a series of subsequent surface reactions, probably involving several C–C bond-scissions, to produce other fragments, additional Hacac and HCu(acac) in the gas phase in the case of the copper surface, and acetone on nickel. A significant amount of acac must nevertheless survive on the surface to high temperatures, because Hacac peaks are seen in the TPD at about 515 and 590 K and the C 1s XPS split associated with acac is seen up to close to 500 K. In terms of atomic layer deposition processes, this suggests that cycles could be design to run at such temperatures as long as an effective hydrogenation agent is used as the second reactant to remove the surface acac a- Hacac. Only a small fraction of carbon is left behind on Ni after heating to 800 K, whereas more carbon and additional oxygen remains on the surface in the case of Cu.
机译:通过使用X射线光电子能谱(XPS)和程序升温脱附(TPD)在真空下探测乙酰基铜(II)乙酰丙酮铜(Cu(acac)2)在Ni(110)和Cu(110)单晶表面上的热化学性质)。还报道了吸附在Ni(110)上的乙酰丙酮(Hacac,CH3COCH2COCH3)的一些数据。在涵盖150 K至至少630 K的温度范围内的多个步骤中确定了化学转化。首先在Ni(110)上的150和180 K以及在160和160上观察到Hacac和3-oxobutanal(CH3COCH2CHO)副产物的解吸。在Cu(110)上分别为185K。接下来可以看到乙酰丙酮(acac)配体的部分损失和吸附几何形状的可能变化,可能产生了HCu(acac),后者分别在200和235 K下从镍和铜表面解吸。在大约300 K的两个表面上都观察到了分子Cu(acac)2的解吸,这可能是由于Cu(acac)和acac表面物质的重组造成的。表面上的剩余铜原子会失去其剩余的acac配体,而直接还原为金属铜。同时,有机配体会进行一系列后续的表面反应,可能涉及多个C–C键断裂,从而产生其他碎片,在铜表面的情况下会在气相中产生其他Hacac和HCu(acac),和丙酮在镍上。尽管如此,仍然有大量的acac能够在表面上幸存下来,直到高温,因为在TPD处大约515和590 K处发现了Hacac峰,并且与acac相关的C 1s XPS分裂最高可达500K。原子层沉积过程,这表明可以将循环设计为在这样的温度下运行,只要将有效的氢化剂用作第二反应物以去除表面acac-Hacac。加热到800 K后,只有一小部分碳留在Ni上,而在Cu的情况下,更多的碳和额外的氧保留在表面上。

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