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首页> 外文期刊>Journal of the IES >In-Line Moisture Monitoring in Semiconductor Process Gases by a Reactive-Metal-Coated Quartz Crystal Microbalance
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In-Line Moisture Monitoring in Semiconductor Process Gases by a Reactive-Metal-Coated Quartz Crystal Microbalance

机译:活性金属涂层石英晶体微天平在线监测半导体工艺气体中的水分

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摘要

A new in-line sensor for trace moisture monitoring has been developed based on a piezoelectric quartz crystal microbalance (QCM) coated with a reactive metal thin film. The properties of the metal coating and QCM allow the sensor to have fast response and fast recovery to moisture in the process gas stream. The properties of the metal-coated QCM also allow the sensor to be compact so it can be in-line in the gas distribution system and readily integrated into the process tools. This paper presents the principle of moisture detection using this technology. The experimental results of accuracy, limit of detection (< 1 ppb), and error analysis of this sensor in parallel with atmospheric pressure ionization mass spectrometry (APIMS) are presented. The experimental setup and procedures are described. The effect of an upstream gas purifier on its rate of response was also studied and the results are presented and discussed. The applications of this technology in semiconductor processing are briefly mentioned.
机译:基于涂覆有反应性金属薄膜的压电石英晶体微量天平(QCM),开发了一种用于痕量水分监测的新型在线传感器。金属涂层和QCM的特性使传感器能够快速响应并快速恢复过程气流中的水分。带有金属涂层的QCM的特性还使传感器紧凑,因此它可以在线安装在气体分配系统中,并易于集成到处理工具中。本文介绍了使用该技术进行水分检测的原理。给出了与大气压电离质谱(APIMS)并行进行的该传感器的准确性,检测极限(<1 ppb)和误差分析的实验结果。描述了实验装置和程序。还研究了上游气体净化器对其响应速度的影响,并介绍和讨论了结果。简要介绍了该技术在半导体加工中的应用。

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