首页> 外文期刊>Journal of the American Chemical Society >CHEMICAL FORCE MICROSCOPY - EXPLOITING CHEMICALLY-MODIFIED TIPS TO QUANTIFY ADHESION, FRICTION, AND FUNCTIONAL GROUP DISTRIBUTIONS IN MOLECULAR ASSEMBLIES
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CHEMICAL FORCE MICROSCOPY - EXPLOITING CHEMICALLY-MODIFIED TIPS TO QUANTIFY ADHESION, FRICTION, AND FUNCTIONAL GROUP DISTRIBUTIONS IN MOLECULAR ASSEMBLIES

机译:化学力显微镜-探索化学修饰的提示以量化分子组件中的附着力,摩擦力和功能基团分布

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Chemical force microscopy (CFM) has been used to measure adhesion and friction forces between probe tips and substrates covalently modified with self-assembled monolayers (SAMs) that terminate in distinct functional groups. Probe tips have been modified with SAMs using a procedure that involves coating commercial Si3N4 cantilever/tip assemblies with a thin layer of polycrystalline Au followed by immersion in a solution of a functionalized thiol. This methodology provides a reproducible means for endowing the probe with different chemical functional groups. The spring constants and radii of the chemically modified cantilever/tip assemblies have been characterized to allow for quantitative friction and adhesion measurements. Au-coated Si and Si substrates have been treated with functionalized thiols and silanes, respectively, to produce SAM coated substrates terminating with different functional groups. A force microscope has been used to characterize the adhesive interactions between probe tips and substrates that have been modified with SAMs which terminate with COOH, CH3, and NH2 functional groups in EtOH and H2O solvents. Force vs distance curves recorded under EtOH show that the interaction between functional groups decreases as follows: COOH/COOH > CH3/CH3 > COOH/CH3. The measured adhesive forces were found to agree well with predictions of the Johnson, Kendall, and Roberts (JKR) theory of adhesive contact and thus show that the observed adhesion forces correlate with the surface free energy of the molecular groups in EtOH. Electrostatic contributions to adhesive forces have also been studied using a COO-/NH3+ tip/surface in aqueous solution. Force vs distance curves recorded as a function of ionic strength show that the observed adhesive interaction decreases with increasing ionic strength. These results have been interpreted in terms of contact and noncontact contributions to the experimentally measured adhesive force. The friction forces between tips and samples modified with COOH and CH3 groups have also been measured as a function of applied load. The magnitude of the friction force was found to decrease in the following manner with different tip/sample functionalities: COOH/COOH > CH3/CH3 > COOH/CH3. Friction forces between different chemical functional groups thus correlate directly with the adhesion forces between these same groups. Specifically, high friction is observed between groups that adhere strongly, while low friction is observed between weakly interacting functional groups. The dependence of friction forces on the tip and sample functionality is shown to be the basis for chemical force microscopy in which lateral force images are interpreted in terms of the strength of both adhesive and frictional interactions between different functional groups. [References: 69]
机译:化学力显微镜(CFM)已用于测量探针末端与被终止于不同官能团的自组装单层(SAM)共价修饰的底物之间的粘附力和摩擦力。探针的尖端已通过SAM进行了修饰,该过程包括用多晶Au薄层涂覆商用Si3N4悬臂/尖端组件,然后将其浸入功能化硫醇溶液中。该方法学为赋予探针不同的化学官能团提供了可重复的手段。经过化学修饰的悬臂/尖端组件的弹簧常数和半径已经过表征,可以进行定量的摩擦和附着力测量。分别用官能化的硫醇和硅烷处理Au涂层的Si和Si衬底,以生产以不同官能团终止的SAM涂层衬底。力显微镜已被用来表征探针尖端和被SAM修饰的底物之间的胶粘剂相互作用,而SAM则以EtOH和H2O溶剂中的COOH,CH3和NH2官能团终止。在EtOH下记录的力与距离的关系曲线表明,官能团之间的相互作用降低如下:COOH / COOH> CH3 / CH3> COOH / CH3。发现测得的粘合力与Johnson,Kendall和Roberts(JKR)粘合接触理论的预测非常吻合,因此表明观察到的粘合力与EtOH中分子基团的表面自由能相关。还使用水溶液中的COO- / NH3 +尖端/表面研究了静电对粘合力的影响。记录的作为离子强度函数的力与距离的关系曲线表明,观察到的粘合剂相互作用随离子强度的增加而降低。这些结果已根据接触和非接触对实验测量的粘合力的贡献进行了解释。还测量了针尖与用COOH和CH3基团修饰的样品之间的摩擦力,它是所施加载荷的函数。发现在不同的针尖/样品官能度下,摩擦力的大小以下列方式降低:COOH / COOH> CH3 / CH3> COOH / CH3。因此,不同化学官能团之间的摩擦力与这些相同基团之间的粘附力直接相关。具体而言,在牢固粘附的基团之间观察到高摩擦,而在弱相互作用的官能团之间观察到低摩擦。摩擦力对针尖和样品功能性的依赖性被证明是化学力显微镜的基础,在化学力显微镜中,横向力图像是根据粘合强度和不同官能团之间的摩擦相互作用来解释的。 [参考:69]

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