机译:在溶液法和气相沉积的基于苯甲酰基-四噻吩基的场效应晶体管中的高电子迁移率:向N型聚噻吩的方向发展
Department of Chemistry and the Materials Research Center,Northwestern University,2145 Sheridan Road, Evanston,Illinois 60208;
Department of Chemistry and the Materials Research Center,Northwestern University,2145 Sheridan Road, Evanston,Illinois 60208;
Department of Chemistry and the Materials Research Center,Northwestern University,2145 Sheridan Road, Evanston,Illinois 60208;
Department of Chemistry and the Materials Research Center,Northwestern University,2145 Sheridan Road, Evanston,Illinois 60208;
Department of Chemistry and the Materials Research Center,Northwestern University,2145 Sheridan Road, Evanston,Illinois 60208;
机译:超薄体(110)n型金属氧化物半导体场效应晶体管中<110>定向电子迁移率优于<100>定向电子迁移率
机译:高电子迁移率在[1]苯并噻吩[3,2-B] [1]苯并噻吩基场效应晶体管:朝向N型BTBTS
机译:通过在In_(0.53)Ga_(0.47)As n型金属-绝缘体-半导体场效应晶体管中沉积等效氧化膜厚度小于1.0nm的HfO_2栅极电介质之前通过原位退火提高电子迁移率
机译:外延生长的石墨烯场效应晶体管,其具有超过1500cm {sup} 2 / vs和孔迁移率超过3400cm {sup} 2 / vs的空间迁移率
机译:选择性接触双沟道高电子迁移率场效应晶体管的制作与分析
机译:将聚合物中的缺电子氮原子嵌入高性能n型聚合物场效应晶体管
机译:溶液浇铸和气相沉积的苯酰基 - 季噻吩基场效应晶体管的高电子迁移率:朝向N型聚苯乙烯
机译:蓝宝石衬底上的高迁移率siGe / si n型结构和场效应晶体管