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Sources of Conductivity and Doping Limits in CdO from Hybrid Density Functional Theory

机译:基于混合密度泛函理论的CdO中电导率和掺杂限的来源

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摘要

CdO has been studied for decades as a prototypical wide band gap transparent conducting oxide with excellent n-type ability. Despite this, uncertainty remains over the source of conductivity in CdO and over the lack of p-type CdO, despite its valence band maximum (VBM) being high with respect to other wide band gap oxides. In this article, we use screened hybrid DFT to study intrinsic defects and hydrogen impurities in CdO and identify for the first time the source of charge carriers in this system. We explain why the oxygen vacancy in CdO acts as a shallow donor and does not display negative-17 behavior similar to all other wide band gap n-type oxides. We also demonstrate that p-type CdO is not achievable, as n-type defects dominate under all growth conditions. Lastly, we estimate theoretical doping limits and explain why CdO can be made transparent by a large Moss-Burstein shift caused by suitable n-type doping.
机译:CdO作为具有出色n型能力的典型宽带隙透明导电氧化物已被研究了数十年。尽管如此,尽管CdO的价带最大值(VBM)相对于其他宽带隙氧化物而言很高,但仍不确定CdO的电导率来源和缺少p型CdO。在本文中,我们使用筛选的混合DFT研究CdO中的固有缺陷和氢杂质,并首次确定该系统中载流子的来源。我们解释了为什么CdO中的氧空位起着浅的供体的作用,而不表现出与所有其他宽带隙n型氧化物相似的负17行为。我们还证明,由于在所有生长条件下n型缺陷都占主导地位,因此无法实现p型CdO。最后,我们估算了理论上的掺杂极限,并解释了为什么可以通过适当的n型掺杂引起的大的Moss-Burstein位移使CdO透明。

著录项

  • 来源
    《Journal of the American Chemical Society》 |2011年第38期|p.15065-15072|共8页
  • 作者单位

    School of Chemistry and CRANN, Trinity College Dublin, Dublin 2, Ireland;

    School of Chemistry and CRANN, Trinity College Dublin, Dublin 2, Ireland;

    School of Chemistry and CRANN, Trinity College Dublin, Dublin 2, Ireland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:14:27

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