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Arcing on Aluminum Anodized Plates Immersed in Low-Density Plasmas

机译:沉浸在低密度等离子体中的铝阳极氧化板上的电弧

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A number of experiments have been done to study characteristics of the plasma contamination and electromagnetic radiation generated by arcing on anodized aluminum plates immersed in low-density plasma. The low-Earth-orbit plasma environment was simulated in a plasma vacuum chamber, where the parameters could be controlled precisely. Diagnostic equipment included two antennas, a mass spectrometer, a spherical langmuir probe, a wire probe, and a very sensitive current probe to measure arc current. All data except for mass spectrometry were obtained in digital form with a sampling interval of 2.5 ns that allowed us to study the radiation spectrum at frequencies up to 200 MHz. We found that the level of interference considerably exceeds the limitations on the level of electromagnetic noise set by technical requirements oh Space Shuttle operation. Experiments with two independently biased plates have shown that the arcing onset on one plate generates a pulse of current on the second plate and that the secondary current pulse has a significant amplitude. The sampling interval for mass spectrometry was 250 ms. This allowed us to obtain the rate of plasma contamination due to arcing. A significant degradation of the coating layer was determined by measurement of the resistance of the plate, which had experienced a few hundred arcs.
机译:已经进行了许多实验来研究等离子体污染的特性,以及通过在低密度等离子体中浸没的阳极氧化铝板上电弧放电产生的电磁辐射的特性。在等离子真空室中模拟了低地球轨道等离子环境,可以精确控制参数。诊断设备包括两个天线,一个质谱仪,一个球形朗缪尔探针,一个导线探针和一个用于测量电弧电流的非常灵敏的电流探针。除质谱法外,所有数据均以2.5 ns的采样间隔以数字形式获得,这使我们能够研究频率高达200 MHz的辐射谱。我们发现干扰水平大大超出了航天飞机运行的技术要求所设定的电磁噪声水平的限制。用两个独立偏置的板进行的实验表明,一块板上的起弧现象会在第二块板上产生电流脉冲,并且次级电流脉冲具有明显的幅度。质谱的采样间隔为250毫秒。这使我们可以获得由于电弧引起的等离子体污染的比率。通过测量板的电阻确定涂层的明显降解,该板经历了几百个电弧。

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