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Analysis of electrochemical impedance and XRD spectoscopy for complex self-assembled film on silver

机译:银上复杂自组装膜的电化学阻抗和XRD谱分析

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摘要

Self-assembled monolayers (SAMs) of (3-mercaptopropy) trimethoxysilane (3-MPT) chemisorbed on silver surfaces were chemically 'modified by 1-octadecanethiol to form self-assembled mixed-monolayers (SAMM) and the co-polymer of N-vinylcarbazole and methyl methacrylate ester (to form complex self-assembled film (CSAF)). The oxidation resistance of these barriers on silver surfaces and some influential factors concerned processes were analyzed by electrochemical impedance spectroscopy (EIS) in a 10 percent NaOH aqueous solution at oxidation potential. X-ray diffraction (XRD) spectroscopy shows that the oxidation occurring on the silver surface may be restrained effectively due to the coating barrier, and CSAF(II) is the best one. Studies also reveal that oxide processes of bare silver and a series of modified silver electrodes in a 10 percent NaOH aqueous solution are of more than two relaxation time constants.
机译:化学吸附在银表面的(3-巯基)三甲氧基硅烷(3-MPT)的自组装单分子层(SAMs)通过1-十八碳硫醇化学修饰形成自组装的混合单分子层(SAMM)和N-的共聚物乙烯基咔唑和甲基丙烯酸甲酯(形成复杂的自组装膜(CSAF))。在10%NaOH水溶液中,在氧化电势下,通过电化学阻抗谱(EIS)分析了这些势垒在银表面的抗氧化性以及与过程有关的一些影响因素。 X射线衍射(XRD)光谱表明,由于涂层的阻挡层,可以有效地抑制在银表面发生的氧化,而CSAF(II)是最好的一种。研究还表明,在10%NaOH水溶液中,裸银和一系列修饰的银电极的氧化过程具有两个以上的弛豫时间常数。

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