Fabrications of Nb-doped TiO₂ (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol–gel method

摘要

Anatase Ti_0.94Nb_0.06O₂ (TNO) films were fabricated on glass substrates by sol–gel method using a dip-coating technique. The annealing treatment was separated into two steps, first in air at 350–550 °C for 1 h and then in vacuum of 4.0 × 10−4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 Ω·cm and the average optical transmittance of about 75% in the visible range, indicating that the sol–gel method is a feasible and promising method to fabricate TNO films. Keywords Nb-doped TiO₂ (TNO) - Sol–gel - Dip-coating - Air annealing treatment - Vacuum annealing treatment