Sol–gel preparation of antireflective coatings at 351 nm with different thickness and improved moisture-resistance

摘要

Antireflective (AR) coatings at 351 nm with different thickness were designed and prepared by sol–gel process using tetraethylorthosilicate as precursor and ammonia as catalyst. The parameters of these coatings, including film thickness and refractive index, were calculated by optical formula and the coatings were prepared accordingly. Sol dilution method was used to adjust the film thickness. The wavelengths of maximum transmission measured by UV–Vis spectrophotometer, were used to monitor the film thickness. It was found that AR coatings with higher thickness possess better abrasion-resistance. Hydroxyl terminated polydimethylsiloxane (PDMS) was added into pure silica sol to improve both the abrasion-resistance and moisture-resistance of AR coating.