New approaches to process simplification for large-area high-resolution TFT-LCDs

摘要

Novel process architectures are proposed for fabricating large-area high-resolution TFT- LCDs with a minimal number of process steps. A low contact resistance between Al bus lines and the Transparent conductive oxide layer, necessary for large-area panels, is obtained by inducing a self- Formed inter-metallic compound layer at the interface without using any additional buffer or capping Layers. For enhanced brightness and resolution, a new TFT array structure integrated on a color-filter Substrate, referred to as an Array on Color Filter(AOC)structure, has been developed.