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Experimental evaluation of a nitrous-oxide axial-injection, end-burning hybrid rocket

机译:一氧化二氮轴向喷射端燃烧混合火箭的实验评估

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This experimental and theoretical work examines the effects of gaseous oxidizer flow rates and pressure on the regression rates of porous fuels for hybrid rocket applications using polyethylene as the porous fuel and gaseous nitrous oxide as the oxidizer as a continuation of previous work performed at the University of Alabama in Huntsville. Nominal test articles were tested using 100 μmnominal fuel pore sizes. Pressures tested ranged from 207 to 1054 kPa, and oxidizer injection velocities ranged from 7.5 to 16.8 ms. Regression rates were determined using pretest and posttest length measurements of the solid fuel. Experimental results supported previous work demonstrating that the regression rate of the porous axial-injection, end-burning hybrid was a function of the chamber pressure as opposed to the oxidizer mass flux typical in conventional hybrids. Regression rates ranged from approximately 0.21 mms at 207 kPa to 1.44 mms at 1054 kPa. The experimental results were compared to an analytical model developed in previous work for qualitative agreement. The model showed qualitative agreement with the experimental results, indicating that it has potential for giving insight into the flame structure in this propellant combination.
机译:这项实验和理论工作研究了气体氧化剂流速和压力对混合动力火箭应用多孔燃料的回归速率的影响,该混合火箭应用聚乙烯作为多孔燃料,而气态一氧化二氮作为氧化剂,这是之前在美国加州大学进行的工作的延续阿拉巴马州亨茨维尔市。使用100μm的名义燃料孔径测试名义测试物品。测试的压力范围为207至1054 kPa,氧化剂的注入速度为7.5至16.8 ms。使用测试前和测试后对固体燃料的长度测量来确定回归率。实验结果支持了先前的工作,证明了多孔轴向注入,端燃烧混合气的回归速率是室压的函数,与传统混合气中典型的氧化剂质量通量相反。回归速率的范围从207 kPa时的约0.21 mms到1054 kPa时的1.44 mms。将实验结果与先前工作中为定性一致性而开发的分析模型进行比较。该模型与实验结果显示出定性的一致性,表明该模型具有深入了解这种推进剂组合中火焰结构的潜力。

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  • 来源
    《Journal of propulsion and power》 |2017年第6期|1555-1560|共6页
  • 作者单位

    University of Alabama in Huntsville, Huntsville, AL, United States,Propulsion Research Center, S225 Technology Hall, United States;

    University of Alabama in Huntsville, Huntsville, AL, United States,Propulsion Research Center, S225 Technology Hall, United States;

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