Application and optical properties of TiO_2 thin Films prepared by chemical vapcur deposition

摘要

The optical properties are presented for TiO_2 thin films prepared by atmosphere chemical vapour deposition (CVD) using TiCl_4, such as transmittance, refractive index, extinction coefficient and optical band gap determined by UV measurement. It is found that TiO_2 thin films deposited at temperatures in the range of 100～250 deg. C using different gas flow ratios(N_2+H_2O : N_2+TiCl_4) have refractive index varied in the range of 2.1～2.82, extinction coefficient of 0.04×10~-3～6.70×10~-3 and optical band gap of 2.8～3.08 eV. The TiO_2 films have been used to dispose phenol solution photocatalytically, the conversion rate of phenol is up to 54.05/100.