机译:通过等离子体增强化学气相沉积制备的用于光学和光催化应用的TiO_2薄膜的特性
Institute of Materials Science and Engineering, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Institute of Materials Science and Engineering, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Institute of Materials Science and Engineering, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Institute of Materials Science and Engineering, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Department of Molecular Physics, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Department of Molecular Physics, Technical University of Lodz, Stefanowskiego 1, 90-924 Lodz, Poland;
Centre for Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 Lodz, Poland;
radio-frequency plasma-enhanced chemical; vapor deposition; titanium dioxide; thin films; optical properties; wetting; structural properties; morphology; raman spectroscopy; atomic force microscopy;
机译:氢稀释对通过等离子体增强化学气相沉积(PE-CVD)制备的氢化纳米晶硅(nc-Si:H)薄膜的结构,电学和光学性质的影响
机译:前驱体浓度对等离子体增强化学气相沉积制备Sn_xS_y薄膜光学和电学性质的影响
机译:等离子体增强化学气相沉积法制备厚度不均匀的非晶Ge {sub} xSe {sub} 1-x薄膜的光学常数
机译:大气压化学气相沉积制备的N掺杂二氧化钛薄膜:增强的可见光光催化活性和抗微生物作用
机译:等离子增强化学气相沉积(PECVD)系统的设计和实现,该系统用于研究碳60聚合物复合薄膜和表面功能化对碳60的影响
机译:通过等离子体增强原子层沉积制备的硅氧氮薄膜的微结构化学光学和电学性质的测量
机译:光纤上的间质硼掺杂的锐钛矿TiO2薄膜:大气压 - 等离子体增强化学气相沉积作为温度敏感基材上的功能氧化物涂层的键