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Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process

机译:PCVD合成石英玻璃工艺中二氧化硅颗粒的特性

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摘要

SiO_2 nanoparticles in PCVD process were investigated by SEM, TEM, and optical emission spectra (OES). There are large spherical SiO_2 particles with diameter of 50-200 nm and more small particles about 10-50 nm in PCVD process. Size of SiO_2 particles is influenced by distance and feeding speed but not electron temperature. The amount of large spherical SiO_2 particles decreases with the increase of distance and decrease of feeding speed due to lower concentration. In addition, the evolution of SiO_2 particles was inferred from the experimental results.
机译:通过SEM,TEM和光发射光谱(OES)研究了PCVD工艺中的SiO_2纳米颗粒。在PCVD工艺中,存在大的球形SiO_2颗粒,直径为50-200 nm,而更小的小颗粒约为10-50 nm。 SiO_2颗粒的大小受距离和进料速度的影响,但不受电子温度的影响。球形SiO_2大颗粒的数量随着距离的增加和进料速度的降低而降低,这是由于浓度较低。另外,从实验结果推断出SiO_2颗粒的演化。

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  • 来源
    《Journal of nanotechnology》 |2016年第2016期|1963847.1-1963847.6|共6页
  • 作者单位

    China Building Materials Academy, Beijing 100024, China;

    China Building Materials Academy, Beijing 100024, China;

    China Building Materials Academy, Beijing 100024, China;

    China Building Materials Academy, Beijing 100024, China;

    China Building Materials Academy, Beijing 100024, China;

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  • 正文语种 eng
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