首页> 外国专利> Mesoporous silica - particles, a process for preparing mesoporous silicon dioxide - particles and mesoporous molded article containing silicon - particles

Mesoporous silica - particles, a process for preparing mesoporous silicon dioxide - particles and mesoporous molded article containing silicon - particles

机译:中孔二氧化硅颗粒,制备中孔二氧化硅颗粒的方法和含硅中孔模塑制品

摘要

An object of the present invention is to provide mesoporous silica - particles, the functions, such as a low refractive index (low - n), low dielectric constant (low - k) and low thermal conductivity and also a molded article can impart to the higher strength. The mesoporous silica - particles in each case comprise a core - particles, the first mesopores, wherein a periphery of the core - particles is covered with silicon dioxide. Preferably, second mesopores, smaller than the first mesopores, in which silicon dioxide - covered part, formed by means of the silicon dioxide - covering provided. The mesoporous silica - particles are prepared by: a manufacturing step for surfactant - complex - silicon dioxide - particles of the mixing of a surfactant, water, of an alkali, an additive containing a hydrophobic part and a silicon dioxide - source, in order in this case, surfactant - complex - silicon dioxide - particles in which the additive containing a hydrophobic part includes a hydrophobic part to increase the volume of micelles, which are to be formed by the surfactant; and a silicon dioxide - covering - step of the addition of the silicon dioxide - source to the surfactant - complex - silicon dioxide - particles, in order in this case, a periphery of core - particles to be covered with silicon dioxide. The penetration of a matrix - material can be inhibited in the mesopores.
机译:本发明的目的是提供介孔二氧化硅-颗粒,其功能例如低折射率(low -n),低介电常数(low-k)和低热导率,并且模制品也可以赋予该颗粒。更高的强度。介孔二氧化硅颗粒在每种情况下均包含核颗粒,即第一中孔,其中核颗粒的外围被二氧化硅覆盖。优选地,提供小于第一中孔的第二中孔,其中设置有二氧化硅-被二氧化硅覆盖的部分。中孔二氧化硅-颗粒通过以下步骤制备:表面活性剂的制备步骤-配合物-二氧化硅-表面活性剂,水,碱,含有疏水性部分的添加剂和二氧化硅的混合颗粒-依次为在这种情况下,表面活性剂-络合物-二氧化硅-颗粒,其中包含疏水部分的添加剂包括疏水部分以增加由表面活性剂形成的胶束的体积;二氧化硅-覆盖-将二氧化硅-源添加至表面活性剂-络合物-二氧化硅-颗粒的步骤,在这种情况下,为核的外围-要被二氧化硅覆盖的颗粒。基质材料的渗透可以在中孔中被抑制。

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