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Plasmonic properties of two-dimensional metallic nanoholes fabricated by focused ion beam lithography

机译:聚焦离子束光刻技术制备二维金属纳米孔的等离子体性能

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摘要

Plasmonic metallic nanoholes are widely used to focus or image in the nanoscale field. In this article, we present the results of the design, fabrication, and plasmonic properties of a two-dimensional metallic pentagram nanohole array. The nanoholes can excite the extraordinary transmission phenomenon. We used the finite-difference time-domain method to design the transmission and the localized surface plasmon resonance electric field distribution in the near field. The focused ion beam method was used to fabricate the nanoholes. The transmittance in the far field was measured by a scanning spectrophotometer. The difference between the design and the experimental results may be caused by the conversion between the near field and the far field. The near field electric field distribution on the surface plasmonic nanoholes was measured by a near-field scanning optical microscope. From our results, we found that the maximum transmission of the nanoholes is 2.4. Therefore, our plasmonic nanohole can significantly enhance the transmission by exciting the plasmonic phenomenon on the surface of the nanostructures.
机译:等离子体金属纳米孔被广泛用于在纳米级领域聚焦或成像。在本文中,我们介绍了二维金属五角星纳米孔阵列的设计,制造和等离子体性能的结果。纳米孔可以激发非凡的透射现象。我们使用时域有限差分法来设计近场中的透射和局部表面等离子体激元共振电场分布。聚焦离子束法用于制造纳米孔。通过扫描分光光度计测量远场中的透射率。设计和实验结果之间的差异可能是由近场和远场之间的转换引起的。通过近场扫描光学显微镜测量在表面等离子体纳米孔上的近场电场分布。根据我们的结果,我们发现纳米孔的最大透射率为2.4。因此,我们的等离子体纳米孔可以通过激发纳米结构表面上的等离子体现象来显着增强传输。

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