Beam guidance system for focusingly guiding X-ray beam from e.g. carbon dioxide high power laser onto tin droplet for EUV lithography, has mirror, where beam-induced changes of beam guidance properties of mirror are partially compensated

摘要

The system has a mirror (7) provided as a reflective beam guidance component. A transmission component (9) e.g. plane parallel plate, is partially transmissive for a beam (3) and provided as a refractive beam guidance component. The transmission component is tiltably arranged in a beam path of the system. The mirror and the transmission component are arranged such that beam-induced changes of beam guidance properties of the mirror are partially compensated by beam-induced changes of beam guidance properties of the transmission component.