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首页> 外文期刊>Journal of Micro/Nanolithography,MEMS and MOEMS >Electrical breakdown at low pressure for planar microelectromechanical systems with 10- to 500-μm gaps
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Electrical breakdown at low pressure for planar microelectromechanical systems with 10- to 500-μm gaps

机译:间隙为10-至500-μm的平面微机电系统的低压电击穿

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An experimental study of the dc breakdown voltage for planarnMEMS interdigitated aluminum electrodes with gaps ranging fromn10 to 500 u0001m is presented. Unlike most research on the breakdown innMEMS electrodes that was performed at atmospheric pressure, this worknfocuses on the effect of gas pressure and gas type on breakdown volt-nage, because this is central for chip-scale plasma generation and fornreliable operation in aerospace applications. The breakdown voltage isnmeasured in helium, argon, and nitrogen atmospheres for pressures be-ntween 102 to 8.104 Pa u00011 to 800 mbaru0002. For higher values of the pres-nsure P, or of the gap d u0001i.e., for high values of the Paschen reducednvariable Pred=P·du0002, classical Paschen scaling is observed. For lowernvalues of Pred, however, significant deviations are seen: the Vbd versus.nPd curve shows an extended flat region rather than a narrow dip. Thesendifferences cannot be attributed to field emission, but are due to thenmany length scales effectively present in a planar geometry u0001on-chip andneven off-chipu0002 that leads to the superposition of several Paschen curves.nGuidelines are formulated for low-pressure operation of MEMS to avoidnor encourage breakdown
机译:提出了间隙介于n10到500 u0001m之间的FlatnMEMS叉指铝电极的直流击穿电压的实验研究。与大多数在大气压下对击穿inMEMS电极进行的研究不同,这项工作着重于气压和气体类型对击穿电压的影响,因为这对于芯片级等离子体产生和在航空航天应用中的不可靠操作至关重要。对于在102至8.104 Pa u00011至800 mbaru0002之间的压力,在氦,氩和氮气氛中测量了击穿电压。对于较高的压力P或间隙d u0001,即对于较高的Paschen减小的变量Pred = P·du0002,可以观察到经典的Paschen缩放。但是,对于Pred的较低值,可以看到显着的偏差:Vbd与nPd曲线显示出一个扩展的平坦区域,而不是一个狭窄的下降。这些差异不能归因于场发射,而是由于许多长度尺度有效地存在于芯片上的平面几何形状u0001和芯片外的0002中,从而导致多个Paschen曲线的叠加。鼓励崩溃

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