Dimensional Metrology with Atomic Force Microscopy: Instruments and Applications

摘要

Call for Papers: The use of atomic force microscopy (AFM) for dimensional metrology of nanostructures has increased steadily during the last two decades. Starting in the 1990s, the national metrology institutes of several nations began to develop AFM instruments that incorporated displacement interferometry to achieve intrinsic traceability to the International System of Units (SI) meter. On the industrial side, the advent of critical-dimension AFM overcame the tip-related limitations of conventional AFM on near-vertical structures-making it possible to bring linewidth reference metrology to the fabrication floor. We are calling prospective authors to submit contributions in the field of AFM dimensional metrology for peer reviewed and archived publication in this special section of JM~3. This special section will be comprised of the following three subtopical areas (please identify one when submitting your manuscript).