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首页> 外文期刊>Journal of microanolithography, MEMS, and MOEMS >Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations
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Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

机译:用严格的耦合波分析和有限元方法模拟对三维结构的椭偏测量进行建模

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摘要

Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of
机译:结合使用严格的耦合波分析(RCWA)和有限元方法(FEM)模拟,可以研究许多有趣的椭偏测量。这项工作特别侧重于模拟具有等离子体活性的铜光栅结构。通过查看近场图像和Mueller矩阵光谱,可以了解物理现象。提出并应用了一种在RCWA仿真中克服收敛困难的通用策略。所使用的示例是具有已知缓慢收敛的铜交叉光栅结构。提供了简单样品的基线模拟,用于比较和确定

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