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Structural and optical study of GaMnAs/GaAs

机译:GaMnAs / GaAs的结构与光学研究

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摘要

GaMnAs/GaAs was obtained with mass-analyzed low energy dual ion beam depostion technique with Mn ion energy of 1000 eV and a dose of 1.5 × 1018 Mn+/cm2 at the substrate temperature of 400°C and was annealed at 840°C. X-ray diffraction spectra showed that Ga5.2Mn, Ga5Mn8, α-Mn and Mn3Ga were obtained in the as-grown sample. After annealing Mn3Ga and α-Mn disappeared, Ga5Mn8 tended to disappear, Ga5.2Mn crystallized better and new phase of Mn2As was generated. The photoluminescence spectra of the as-grown sample showed that the 1.5042 eV GaAs exciton peak, 1.4875 eV peak involving a carbon acceptor and a broad band near 1.35 eV. After annealing at 840°C, the 1.5042 eV peak and 1.4875 eV shifted to 1.5065 and 1.4894 eV, respectively, and the photoluminescence intensity of the 1.35 eV band increased greatly.
机译:GaMnAs / GaAs是通过质量分析的低能双离子束消除技术获得的,Mn离子能量为1000 eV,剂量为1.5×1018 Mn + / cm2 。 400°C并在840°C退火。 X射线衍射图谱表明,在样品生长过程中获得了Ga5.2 Mn,Ga5 Mn8 ,α-Mn和Mn3 Ga。退火后Mn3 Ga和α-Mn消失,Ga5 Mn8 趋于消失,Ga5.2 Mn结晶更好,并生成了新的Mn2 As相。所生长样品的光致发光光谱显示,1.5042 eV GaAs激子峰,1.4875 eV峰涉及碳受体和接近1.35 eV的宽带。在840°C退火后,峰的1.5042 eV和1.4875 eV分别移至1.5065和1.4894 eV,1.35 eV波段的光致发光强度大大提高。

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  • 来源
    《Journal of Materials Science》 |2004年第2期|631-634|共4页
  • 作者单位

    Laboratory of Semiconductor Materials Science Institute of Semiconductor Chinese Academy of Science;

    Laboratory of Semiconductor Materials Science Institute of Semiconductor Chinese Academy of ScienceNational Microgravity Laboratory of Chinese Academy of Science;

    Laboratory of Semiconductor Materials Science Institute of Semiconductor Chinese Academy of Science;

    Laboratory of Semiconductor Materials Science Institute of Semiconductor Chinese Academy of Science;

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