...
首页> 外文期刊>Journal of Materials Science >Characteristics of brush plated ZnTe thin films
【24h】

Characteristics of brush plated ZnTe thin films

机译:刷镀ZnTe薄膜的特性

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Zinc telluride thin films were deposited by the brush plating technique at a potential of −0.90 V (SCE) on conducting glass and titanium substrates at different temperatures in the range 30–90°C. The films were polycrystalline in nature with peaks corresponding to the cubic phase. Direct band gap of 2.30 eV was observed. XPS studiers indicated the formation of ZnTe. Depth profiling studies indicated a uniform distribution of Zn and Te throughout the entire thickness. EDAX measurements were made on the films and it was found that there was a slight excess of Te.
机译:在30-90°C的不同温度下,通过刷镀技术在导电玻璃和钛基板上以-0.90 V(SCE)的电位沉积碲化锌薄膜。膜本质上是多晶的,具有对应于立方相的峰。观察到直接带隙为2.30 eV。 XPS研究人员指出了ZnTe的形成。深度剖析研究表明Zn和Te在整个厚度上均匀分布。在膜上进行EDAX测量,发现Te略有过量。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号