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Structural and electrical properties of brush plated ZnTe films

机译:刷镀ZnTe薄膜的结构和电性能

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Zinc telluride thin films were deposited by the brush plating technique at a potential of -0.90 V (SCE) on conducting glass and titanium substrates at different temperatures in the range 30-90℃. The films were polycrystalline in nature with peaks corresponding to the cubic phase. Direct band gap of 2.30 eV was observed. XPS studiers indicated the formation of ZnTe. Depth profiling studies indicated a uniform distribution of Zn and Te throughout the entire thickness. EDAX measurements were made on the films and it was found that there was a slight excess of Te. The carrier concentration was found to vary from 10~(14)-10~(15) cm~(-3) with increase of substrate temperature. The mobility was found to vary from 5 to 60 cm~2 V~(-1) s~(-1).
机译:在30-90℃的不同温度下,通过刷镀技术在导电玻璃和钛基板上以-0.90 V(SCE)的电位沉积碲化锌薄膜。膜本质上是多晶的,具有对应于立方相的峰。观察到直接带隙为2.30 eV。 XPS研究人员指出了ZnTe的形成。深度剖析研究表明Zn和Te在整个厚度上均匀分布。在膜上进行EDAX测量,发现Te略有过量。发现载体浓度随底物温度的升高而在10〜(14)-10〜(15)cm〜(-3)之间变化。发现迁移率在5至60cm〜2 V〜(-1)s〜(-1)之间变化。

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