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首页> 外文期刊>Journal of Materials Science >Effect of substitution of Sn for Bi on structural and electrical transport properties of SnS thin films
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Effect of substitution of Sn for Bi on structural and electrical transport properties of SnS thin films

机译:Sn替代Bi对SnS薄膜结构和电输运性能的影响

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In this work, results are reported concerning the effect of the Bi concentration on the structural and electrical transport properties of SnS thin films, grown through a chemical reaction of the metallic precursors with elemental sulfur (sulfurization) in a two-stage process. XRD measurements revealed that the samples deposited by sulfurization of Sn or Bi grow in the SnS and Bi2S3 phases, respectively, whereas those obtained by sulfurization of a Sn:Bi alloy grow with a mixture of several phases. Special emphasis was placed on studying through σ versus T measurements, the effect of the Bi concentration on the transport properties of SnS:Bi films. To identify the dominant transport mechanisms, the σ versus T curves were analyzed in two different temperature ranges. It was also found that in the range of temperatures greater than 300 K, the conductivity is predominantly affected by transport of free carriers in extended states of the conduction band, whereas in the range of temperatures below 250 K, the conductivity is dominated by the VRH (variable range hopping) transport mechanism.
机译:在这项工作中,报告了有关Bi浓度对SnS薄膜的结构和电传输特性的影响的结果,该SnS薄膜是通过金属前体与元素硫的化学反应(硫化)在两步过程中生长的。 XRD测量表明,通过硫化Sn或Bi沉积的样品分别在SnS和Bi 2 S 3 相中生长,而通过Sn:Bi硫化获得的样品分别在SnS和Bi 2 S 3 相中生长。合金以几种相的混合物生长。特别强调通过σvs T测量研究Bi浓度对SnS:Bi薄膜传输特性的影响。为了确定主要的传输机制,在两个不同的温度范围内分析了σ与T曲线。还发现,在高于300 K的温度范围内,电导率主要受导带扩展态中自由载流子传输的影响,而在低于250 K的温度范围内,电导率受VRH支配(可变范围跳变)传输机制。

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