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首页> 外文期刊>Journal of materials science >Influences of Co~(2+) doping on Ba_3(VO_4)_2 ceramic with low dielectric constant, low sintering temperature,high Q*f and positive τ_f
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Influences of Co~(2+) doping on Ba_3(VO_4)_2 ceramic with low dielectric constant, low sintering temperature,high Q*f and positive τ_f

机译:具有低介电常数,低烧结温度,高Q * f和正τ_f的CO〜(2+)掺杂对Ba_3(VO_4)_2陶瓷的影响

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摘要

The dielectric properties and sintering behavior of cobalt-doped Ba_3(VO_4)_2 microwave dielectric ceramic prepared by the traditional solid-state reaction method were systematic researched. The phase structure and grain morphology of the ceramics were studied by XRD and SEM analysis. Densification temperature of cobalt-doped Ba_3(VO_4)_2 was successfully decreased from 1100 to 925 °C. The second-phase Ba_2V_2O_7 was formed as x = 0.05, and the second phase gradually increased as x increased. Electro-magnetic testing results show that the dielectric constant and bulk density were gradually falling with x increased, the Q*f value of ceramic has been improved, and the peak of Q*f obtained is x = 0.3 sintered at 925 °C. The optimal dielectric properties are ε_r = 13.2, Q*f = 54,063 GHz at 10.6 GHz and τ_f = + 18.7 ppm/°C, sintered at 925 °C, which may be widely used in adjustment of τ_f for LTCC ceramics with negative τ_f while maintaining excellent performances.
机译:通过传统固态反应方法制备的钴掺杂Ba_3(VO_4)_2微波介质陶瓷的介电性能和烧结行为进行了系统的研究。 通过XRD和SEM分析研究了陶瓷的相结构和晶粒形态。 掺杂钴掺杂的Ba_3(VO_4)_2的致密化温度从1100℃加速下降至925℃。 第二相Ba_2V_2O_7形成为x = 0.05,并且随着x增加,第二相逐渐增加。 电磁测试结果表明,施介质恒定和堆积密度随X逐渐落下,陶瓷的Q * F值得到改善,并且获得的Q * F的峰值是X = 0.3在925℃下烧结。 最佳电介质特性是ε_R= 13.2,Q * f = 54,063GHz,10.6 GHz和τ_f= 18.7ppm /°C,在925°C时烧结,可以广泛用于调整LTCC陶瓷的τf,而negative 保持良好的表演。

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  • 来源
    《Journal of materials science》 |2021年第14期|19511-19518|共8页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054 China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054 China Yangtze Delta Region Institute (Huzhou) University of Electronic Science and Technology of China Huzhou 313001 China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054 China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054 China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054 China;

    College of Communication Engineering Chengdu University of Information Technology Chengdu 610225 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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